Laplace- and diffusion-field-controlled growth in electrochemical deposition
Phys Rev Lett
.
1989 Jun 5;62(23):2703-2706.
doi: 10.1103/PhysRevLett.62.2703.
Authors
P Garik
,
D Barkey
,
E Ben-Jacob
,
E Bochner
,
N Broxholm
,
B Miller
,
B Orr
,
R Zamir
PMID:
10040066
DOI:
10.1103/PhysRevLett.62.2703
No abstract available