Ion-assisted deposition of optical thin films: low energy vs high energy bombardment
Appl Opt
.
1984 Feb 15;23(4):552.
doi: 10.1364/ao.23.000552.
Authors
J R McNeil
,
A C Barron
,
S R Wilson
,
W C Herrmann
PMID:
18204599
DOI:
10.1364/ao.23.000552
No abstract available