Characterization of Alq3 thin films by a near-field microwave microprobe

Artur Hovsepyan; Huneung Lee; Tigran Sargsyan; Harutyun Melikyan; Youngwoon Yoon; Arsen Babajanyan; Barry Friedman; Kiejin Lee

doi:10.1016/j.ultramic.2008.04.013

Characterization of Alq3 thin films by a near-field microwave microprobe

Ultramicroscopy. 2008 Sep;108(10):1058-61. doi: 10.1016/j.ultramic.2008.04.013. Epub 2008 May 3.

Authors

Artur Hovsepyan¹, Huneung Lee, Tigran Sargsyan, Harutyun Melikyan, Youngwoon Yoon, Arsen Babajanyan, Barry Friedman, Kiejin Lee

Affiliation

¹ Department of Physics and Interdisciplinary Program of Integrated Biotechnology, Sogang University, Seoul 121-742, Republic of Korea.

PMID: 18547735
DOI: 10.1016/j.ultramic.2008.04.013

Abstract

We observed tris-8-hydroxyquinoline aluminum (Alq3) thin films dependence on substrate heating temperatures by using a near-field microwave microprobe (NFMM) and by optical absorption at wavelengths between 200 and 900 nm. The changes of absorption intensity at different substrate heating temperatures are correlated to the changes in the sheet resistance of Alq3 thin films.

Publication types

Research Support, Non-U.S. Gov't