In this work, we investigated the effect of surface treatment as release layer and adhesion promoter for UV-Nanoimprint lithography and measured the surface adhesion force by using tensile separation force of Instron equipment. Several Self-Assembled Monolayers (SAMs) of 3-Acryloxypropyl methyl dichlorosilane (APMDS) 3-Aminopropyl-triethoxysilane (APTS), and 3-Glycidoxypropyltrimethoxysilane (GPTS) as adhesion promoters and (1H,1H,2H,2H-perfluorooctyl)trichlorosilane (FOTS) as release layer were fabricated by vapor deposition method and were compared with oxygen plasma treatment. APMDS could strongly improve the adhesion force between UV-curable acrylate resin and silicon substrate because of strong covalent bonding. Finally, we could successfully fabricate various imprint patterns by using proper surface treatment of SAMs.