CO(2) laser is an interesting tool to repair defects on silica optics. We studied UV nanosecond laser-induced damage in fused silica after CO(2) laser heating. The localization of damage sites and the laser damage threshold are closely related to stress area in silica induced by heating. By applying a suitable second laser heating, we managed to eliminate the debris issued from redeposited silica and to modify the stress area. As a consequence, a significant increase of laser resistance has been observed. This process offers the possibility to improve damage repairing sufficiently to extend the lifetime of the silica components.