Quantum resistance metrology using graphene

Rep Prog Phys. 2013 Oct;76(10):104501. doi: 10.1088/0034-4885/76/10/104501. Epub 2013 Oct 3.

Abstract

In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

Publication types

  • Research Support, Non-U.S. Gov't
  • Review

MeSH terms

  • Computer Simulation
  • Electric Impedance*
  • Graphite / chemistry*
  • Graphite / standards*
  • Models, Chemical*
  • Quantum Theory*
  • Reference Values

Substances

  • Graphite