Defect-free thin InAs nanowires grown using molecular beam epitaxy

Nanoscale. 2016 Jan 21;8(3):1401-6. doi: 10.1039/c5nr06429e.

Abstract

In this study, we designed a simple method to achieve the growth of defect-free thin InAs nanowires with a lateral dimension well below their Bohr radius on different substrate orientations. By depositing and annealing a thin layer of Au thin film on a (100) substrate surface, we have achieved the growth of defect-free uniform-sized thin InAs nanowires. This study provides a strategy to achieve the growth of pure defect-free thin nanowires.

Publication types

  • Research Support, Non-U.S. Gov't