RBS Depth Profiling Analysis of (Ti, Al)N/MoN and CrN/MoN Multilayers

Bin Han; Zesong Wang; Neena Devi; K K Kondamareddy; Zhenguo Wang; Na Li; Wenbin Zuo; Dejun Fu; Chuansheng Liu

doi:10.1186/s11671-017-1921-3

RBS Depth Profiling Analysis of (Ti, Al)N/MoN and CrN/MoN Multilayers

Nanoscale Res Lett. 2017 Dec;12(1):161. doi: 10.1186/s11671-017-1921-3. Epub 2017 Mar 1.

Authors

Bin Han^{1

2}, Zesong Wang¹, Neena Devi², K K Kondamareddy¹, Zhenguo Wang², Na Li¹, Wenbin Zuo², Dejun Fu³, Chuansheng Liu⁴

Affiliations

¹ Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
² Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
³ Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China. [email protected].
⁴ Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China. [email protected].

Abstract

(Ti, Al)N/MoN and CrN/MoN multilayered films were synthesized on Si (100) surface by multi-cathodic arc ion plating system with various bilayer periods. The elemental composition and depth profiling of the films were investigated by Rutherford backscattering spectroscopy (RBS) using 2.42 and 1.52 MeV Li²⁺ ion beams and different incident angles (0°, 15°, 37°, and 53°). The microstructures of (Ti, Al)N/MoN multilayered films were evaluated by X-ray diffraction. The multilayer periods and thickness of the multilayered films were characterized by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HR-TEM) and then compared with RBS results.

Keywords: Depth profiling; Microstructure; MoN; Multilayer; RBS.