Author Correction: Physical and chemical descriptors for predicting interfacial thermal resistance

Sci Data. 2020 Feb 17;7(1):61. doi: 10.1038/s41597-020-0405-y.

¹ Center for Materials research by Information Integration (CMI2), Research and Services Division of Materials Data and Integrated System (MaDIS), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan.
² Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo, 169-8555, Japan.
³ State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian, 350002, China.
⁴ Center for Materials research by Information Integration (CMI2), Research and Services Division of Materials Data and Integrated System (MaDIS), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan. [email protected].

Abstract

An amendment to this paper has been published and can be accessed via a link at the top of the paper.