Thermally induced metastable defects in hydrogenated amorphous silicon and silicon-carbon alloy films
Phys Rev B Condens Matter
.
1988 Oct 15;38(12):8371-8376.
doi: 10.1103/physrevb.38.8371.
Authors
X Xu
,
A Okumura
,
A Morimoto
,
M Kumeda
,
T Shimizu
PMID:
9945594
DOI:
10.1103/physrevb.38.8371
No abstract available