Hydrogen bonding in amorphous silicon with use of the low-pressure chemical-vapor-deposition technique
Phys Rev B Condens Matter
.
1991 Mar 15;43(8):6627-6632.
doi: 10.1103/physrevb.43.6627.
Authors
G Amato
,
Della Mea G
,
F Fizzotti
,
C Manfredotti
,
R Marchisio
,
A Paccagnella
PMID:
9998105
DOI:
10.1103/physrevb.43.6627
No abstract available