Xia Q - Search Results

1

Sub-10 nm self-enclosed self-limited nanofluidic channel arrays.

Xia Q, Morton KJ, Austin RH, Chou SY. Xia Q, et al. Nano Lett. 2008 Nov;8(11):3830-3. doi: 10.1021/nl802219b. Epub 2008 Oct 22. Nano Lett. 2008. PMID: 18939885

2

Electrostatic force-assisted nanoimprint lithography (EFAN).

Liang X, Zhang W, Li M, Xia Q, Wu W, Ge H, Huang X, Chou SY. Liang X, et al. Among authors: xia q. Nano Lett. 2005 Mar;5(3):527-30. doi: 10.1021/nl0480161. Nano Lett. 2005. PMID: 15755108

3

Improved nanofabrication through guided transient liquefaction.

Chou SY, Xia Q. Chou SY, et al. Among authors: xia q. Nat Nanotechnol. 2008 May;3(5):295-300. doi: 10.1038/nnano.2008.95. Epub 2008 May 4. Nat Nanotechnol. 2008. PMID: 18654527

4

The fabrication of periodic metal nanodot arrays through pulsed laser melting induced fragmentation of metal nanogratings.

Xia Q, Chou SY. Xia Q, et al. Nanotechnology. 2009 Jul 15;20(28):285310. doi: 10.1088/0957-4484/20/28/285310. Epub 2009 Jun 23. Nanotechnology. 2009. PMID: 19546488

5

Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction.

Xia Q, Murphy PF, Gao H, Chou SY. Xia Q, et al. Nanotechnology. 2009 Aug 26;20(34):345302. doi: 10.1088/0957-4484/20/34/345302. Epub 2009 Aug 4. Nanotechnology. 2009. PMID: 19652285

6

Fabrication of a 60-nm-diameter perfectly round metal-dot array over a large area on a plastic substrate using nanoimprint lithography and self-perfection by liquefaction.

Wang C, Xia Q, Li WD, Fu Z, Morton KJ, Chou SY. Wang C, et al. Among authors: xia q. Small. 2010 Jun 6;6(11):1242-7. doi: 10.1002/smll.201000104. Small. 2010. PMID: 20449853

7

Fabrication of sub-25 nm diameter pillar nanoimprint molds with smooth sidewalls using self-perfection by liquefaction and reactive ion etching.

Xia Q, Chou SY. Xia Q, et al. Nanotechnology. 2008 Nov 12;19(45):455301. doi: 10.1088/0957-4484/19/45/455301. Epub 2008 Oct 8. Nanotechnology. 2008. PMID: 21832766

8

Sub-10 nm nanoimprint lithography by wafer bowing.

Wu W, Tong WM, Bartman J, Chen Y, Walmsley R, Yu Z, Xia Q, Park I, Picciotto C, Gao J, Wang SY, Morecroft D, Yang J, Berggren KK, Williams RS. Wu W, et al. Among authors: xia q. Nano Lett. 2008 Nov;8(11):3865-9. doi: 10.1021/nl802295n. Epub 2008 Oct 7. Nano Lett. 2008. PMID: 18837563

9

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

Li Z, Gu Y, Wang L, Ge H, Wu W, Xia Q, Yuan C, Chen Y, Cui B, Williams RS. Li Z, et al. Among authors: xia q. Nano Lett. 2009 Jun;9(6):2306-10. doi: 10.1021/nl9004892. Nano Lett. 2009. PMID: 19422192 Free article.

10

Self-aligned memristor cross-point arrays fabricated with one nanoimprint lithography step.

Xia Q, Yang JJ, Wu W, Li X, Williams RS. Xia Q, et al. Nano Lett. 2010 Aug 11;10(8):2909-14. doi: 10.1021/nl1017157. Nano Lett. 2010. PMID: 20590084

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