Lee ES - Search Results

1

Measurement of surface adhesion force of adhesion promoter and release layer for UV-nanoimprint lithography.

Choi DG, Lee DI, Kim KD, Jeong JH, Choi JH, Lee ES. Choi DG, et al. Among authors: lee di, lee es. J Nanosci Nanotechnol. 2009 Feb;9(2):769-73. doi: 10.1166/jnn.2009.c021. J Nanosci Nanotechnol. 2009. PMID: 19441389

2

Fabrication of fluorine-doped diamond-like carbon stamps for UV nanoimprint lithography.

Altun AO, Jeong JH, Rha JJ, Choi DG, Kim KD, Lee ES. Altun AO, et al. Among authors: lee es. Nanotechnology. 2006 Sep 28;17(18):4659-63. doi: 10.1088/0957-4484/17/18/022. Epub 2006 Aug 30. Nanotechnology. 2006. PMID: 21727593

3

Fabrication of nano- and micro-scale UV imprint stamp using diamond-like carbon coating technology.

Lee ES, Jeong JH, Kim KD, Sim YS, Choi DG, Choi J, Park SH, Lim TW, Yang DY, Cha NG, Park JG, Lee WR. Lee ES, et al. Among authors: lee wr. J Nanosci Nanotechnol. 2006 Nov;6(11):3619-23. J Nanosci Nanotechnol. 2006. PMID: 17252823

4

Stamping-based planarization of flexible substrate for low-pressure UV nanoimprint lithography.

Altun AO, Jeong JH, Jung SU, Kim KD, Choi DG, Choi JH, Shim JY, Lee DI, Lee ES. Altun AO, et al. Among authors: lee di, lee es. J Nanosci Nanotechnol. 2008 Nov;8(11):5673-7. doi: 10.1166/jnn.2008.254. J Nanosci Nanotechnol. 2008. PMID: 19198287

5

Pattern-definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates.

Lee J, Choi DG, Altun AO, Kim KD, Choi JH, Lee ES, Jeong JH. Lee J, et al. Among authors: lee es. J Nanosci Nanotechnol. 2010 Sep;10(9):5680-4. doi: 10.1166/jnn.2010.2450. J Nanosci Nanotechnol. 2010. PMID: 21133091

6

Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography.

Altun AO, Jeong JH, Rha JJ, Kim KD, Lee ES. Altun AO, et al. Among authors: lee es. Nanotechnology. 2007 Nov 21;18(46):465302. doi: 10.1088/0957-4484/18/46/465302. Epub 2007 Oct 17. Nanotechnology. 2007. PMID: 21730473

7

Nanotextured Polymer Substrate for Flexible and Mechanically Robust Metal Electrodes by Nanoimprint Lithography.

Eom H, Kim JH, Hur J, Kim TS, Sung SK, Choi JH, Lee E, Jeong JH, Park I. Eom H, et al. ACS Appl Mater Interfaces. 2015 Nov 18;7(45):25171-9. doi: 10.1021/acsami.5b06631. Epub 2015 Nov 9. ACS Appl Mater Interfaces. 2015. PMID: 26501554

8

Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.

Choi DG, Jeong JH, Sim YS, Lee ES, Kim WS, Bae BS. Choi DG, et al. Among authors: lee es. Langmuir. 2005 Oct 11;21(21):9390-2. doi: 10.1021/la0513205. Langmuir. 2005. PMID: 16207009

9

Nanoscopic Pd line arrays using nanocontact printed dendrimers.

Jang SG, Choi DG, Kim S, Jeong JH, Lee ES, Yang SM. Jang SG, et al. Among authors: lee es. Langmuir. 2006 Mar 28;22(7):3326-31. doi: 10.1021/la0525170. Langmuir. 2006. PMID: 16548596

10

The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography.

Koo N, Plachetka U, Otto M, Bolten J, Jeong JH, Lee ES, Kurz H. Koo N, et al. Among authors: lee es. Nanotechnology. 2008 Jun 4;19(22):225304. doi: 10.1088/0957-4484/19/22/225304. Epub 2008 Apr 25. Nanotechnology. 2008. PMID: 21825759

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