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Page 1
Development of a microwave ion source for ion implantations.
Takahashi N, Murata H, Kitami H, Mitsubori H, Sakuraba J, Soga T, Aoki Y, Katoh T. Takahashi N, et al. Among authors: sakuraba j. Rev Sci Instrum. 2016 Feb;87(2):02C108. doi: 10.1063/1.4935014. Rev Sci Instrum. 2016. PMID: 26932118
High current DC negative ion source for cyclotron.
Etoh H, Onai M, Aoki Y, Mitsubori H, Arakawa Y, Sakuraba J, Kato T, Mitsumoto T, Hiasa T, Yajima S, Shibata T, Hatayama A, Okumura Y. Etoh H, et al. Among authors: sakuraba j. Rev Sci Instrum. 2016 Feb;87(2):02B135. doi: 10.1063/1.4934613. Rev Sci Instrum. 2016. PMID: 26932017
Development of microwave ion source for industrial applications.
Takahashi N, Murata H, Mitsubori H, Sakuraba J, Soga T, Aoki Y, Katoh T, Saitoh Y, Yamada K, Ikenaga N, Sakudo N. Takahashi N, et al. Among authors: sakuraba j. Rev Sci Instrum. 2014 Feb;85(2):02C306. doi: 10.1063/1.4826675. Rev Sci Instrum. 2014. PMID: 24593643
Development of a high current H(-) ion source for cyclotrons.
Etoh H, Aoki Y, Mitsubori H, Arakawa Y, Mitsumoto T, Yajima S, Sakuraba J, Kato T, Okumura Y. Etoh H, et al. Among authors: sakuraba j. Rev Sci Instrum. 2014 Feb;85(2):02B107. doi: 10.1063/1.4827577. Rev Sci Instrum. 2014. PMID: 24593547