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Non-lift-off block copolymer lithography of 25 nm magnetic nanodot arrays.
ACS Appl Mater Interfaces. 2011 Sep;3(9):3472-81. doi: 10.1021/am200693x. Epub 2011 Aug 25.
ACS Appl Mater Interfaces. 2011.
PMID: 21830808
Self-assembled block copolymer thin films as water filtration membranes.
Phillip WA, O'Neill B, Rodwogin M, Hillmyer MA, Cussler EL.
Phillip WA, et al.
ACS Appl Mater Interfaces. 2010 Mar;2(3):847-53. doi: 10.1021/am900882t.
ACS Appl Mater Interfaces. 2010.
PMID: 20356290
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Nanoscale rings from silicon-containing triblock terpolymers.
Rodwogin MD, Baruth A, Jackson EA, Leighton C, Hillmyer MA.
Rodwogin MD, et al.
ACS Appl Mater Interfaces. 2012 Jul 25;4(7):3550-7. doi: 10.1021/am300603x. Epub 2012 Jul 3.
ACS Appl Mater Interfaces. 2012.
PMID: 22757616
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Polylactide-poly(dimethylsiloxane)-polylactide triblock copolymers as multifunctional materials for nanolithographic applications.
Rodwogin MD, Spanjers CS, Leighton C, Hillmyer MA.
Rodwogin MD, et al.
ACS Nano. 2010 Feb 23;4(2):725-32. doi: 10.1021/nn901190a.
ACS Nano. 2010.
PMID: 20112923
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