Yeom GY - Search Results

1

Wide-range controllable n-doping of molybdenum disulfide (MoS2) through thermal and optical activation.

Park HY, Lim MH, Jeon J, Yoo G, Kang DH, Jang SK, Jeon MH, Lee Y, Cho JH, Yeom GY, Jung WS, Lee J, Park S, Lee S, Park JH. Park HY, et al. Among authors: yeom gy. ACS Nano. 2015 Mar 24;9(3):2368-76. doi: 10.1021/acsnano.5b00153. Epub 2015 Feb 18. ACS Nano. 2015. PMID: 25692499

2

Plasma treatment of thin film coated with graphene flakes for the reduction of sheet resistance.

Kim SH, Oh JS, Kim KN, Seo JS, Jeon MH, Yang KC, Yeom GY. Kim SH, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2013 Dec;13(12):8090-4. doi: 10.1166/jnn.2013.8191. J Nanosci Nanotechnol. 2013. PMID: 24266197

3

Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene.

Pham VP, Kim KN, Jeon MH, Kim KS, Yeom GY. Pham VP, et al. Among authors: yeom gy. Nanoscale. 2014 Dec 21;6(24):15301-8. doi: 10.1039/c4nr04387a. Epub 2014 Nov 11. Nanoscale. 2014. PMID: 25385489

4

Controllable nondegenerate p-type doping of tungsten diselenide by octadecyltrichlorosilane.

Kang DH, Shim J, Jang SK, Jeon J, Jeon MH, Yeom GY, Jung WS, Jang YH, Lee S, Park JH. Kang DH, et al. Among authors: yeom gy. ACS Nano. 2015 Feb 24;9(2):1099-107. doi: 10.1021/nn5074435. Epub 2015 Jan 28. ACS Nano. 2015. PMID: 25629805

5

Controlled Layer-by-Layer Etching of MoS₂.

Lin T, Kang B, Jeon M, Huffman C, Jeon J, Lee S, Han W, Lee J, Lee S, Yeom G, Kim K. Lin T, et al. ACS Appl Mater Interfaces. 2015 Jul 29;7(29):15892-7. doi: 10.1021/acsami.5b03491. Epub 2015 Jul 14. ACS Appl Mater Interfaces. 2015. PMID: 26091282

6

Controlled MoS₂ layer etching using CF₄ plasma.

Jeon MH, Ahn C, Kim H, Kim KN, LiN TZ, Qin H, Kim Y, Lee S, Kim T, Yeom GY. Jeon MH, et al. Among authors: yeom gy. Nanotechnology. 2015 Sep 4;26(35):355706. doi: 10.1088/0957-4484/26/35/355706. Epub 2015 Aug 12. Nanotechnology. 2015. PMID: 26267409

7

Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma.

Jeon MH, Park JW, Yun DH, Kim KN, Yeom GY. Jeon MH, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2015 Nov;15(11):8577-83. doi: 10.1166/jnn.2015.11489. J Nanosci Nanotechnol. 2015. PMID: 26726555

8

Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas.

Kim NH, Jeon MH, Kim TH, Yeom GY. Kim NH, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2015 Nov;15(11):8667-73. doi: 10.1166/jnn.2015.11488. J Nanosci Nanotechnol. 2015. PMID: 26726572

9

A High-Performance WSe2 /h-BN Photodetector using a Triphenylphosphine (PPh3 )-Based n-Doping Technique.

Jo SH, Kang DH, Shim J, Jeon J, Jeon MH, Yoo G, Kim J, Lee J, Yeom GY, Lee S, Yu HY, Choi C, Park JH. Jo SH, et al. Among authors: yeom gy. Adv Mater. 2016 Jun;28(24):4824-31. doi: 10.1002/adma.201600032. Epub 2016 Apr 23. Adv Mater. 2016. PMID: 27106134

10

High-Performance 2D Rhenium Disulfide (ReS2 ) Transistors and Photodetectors by Oxygen Plasma Treatment.

Shim J, Oh A, Kang DH, Oh S, Jang SK, Jeon J, Jeon MH, Kim M, Choi C, Lee J, Lee S, Yeom GY, Song YJ, Park JH. Shim J, et al. Among authors: yeom gy. Adv Mater. 2016 Aug;28(32):6985-92. doi: 10.1002/adma.201601002. Epub 2016 May 20. Adv Mater. 2016. PMID: 27206245

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