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Binding groups for highly ordered SAM formation: carboxylic versus thiol.
Chem Commun (Camb). 2017 May 23;53(42):5748-5751. doi: 10.1039/c7cc01939d.
Chem Commun (Camb). 2017.
PMID: 28492691
Characterizing the metal-SAM interface in tunneling junctions.
Bowers CM, Liao KC, Zaba T, Rappoport D, Baghbanzadeh M, Breiten B, Krzykawska A, Cyganik P, Whitesides GM.
Bowers CM, et al. Among authors: krzykawska a.
ACS Nano. 2015 Feb 24;9(2):1471-7. doi: 10.1021/nn5059216. Epub 2015 Jan 26.
ACS Nano. 2015.
PMID: 25578805
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N-Heterocyclic Carbenes for the Self-Assembly of Thin and Highly Insulating Monolayers with High Quality and Stability.
Krzykawska A, Wróbel M, Kozieł K, Cyganik P.
Krzykawska A, et al.
ACS Nano. 2020 May 26;14(5):6043-6057. doi: 10.1021/acsnano.0c01733. Epub 2020 May 1.
ACS Nano. 2020.
PMID: 32343123
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Correction to N-Heterocyclic Carbenes for the Self-Assembly of Thin and Highly Insulating Monolayers with High Quality and Stability.
Krzykawska A, Wróbel M, Kozieł K, Cyganik P.
Krzykawska A, et al.
ACS Nano. 2023 Jul 11;17(13):12933. doi: 10.1021/acsnano.3c04567. Epub 2023 Jun 16.
ACS Nano. 2023.
PMID: 37326979
No abstract available.
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