Cha SK - Search Results

1

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning.

Jin HM, Park DY, Jeong SJ, Lee GY, Kim JY, Mun JH, Cha SK, Lim J, Kim JS, Kim KH, Lee KJ, Kim SO. Jin HM, et al. Among authors: cha sk. Adv Mater. 2017 Aug;29(32). doi: 10.1002/adma.201700595. Epub 2017 Jun 21. Adv Mater. 2017. PMID: 28635174

2

Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer.

Jin HM, Lee SH, Kim JY, Son SW, Kim BH, Lee HK, Mun JH, Cha SK, Kim JS, Nealey PF, Lee KJ, Kim SO. Jin HM, et al. Among authors: cha sk. ACS Nano. 2016 Mar 22;10(3):3435-42. doi: 10.1021/acsnano.5b07511. Epub 2016 Feb 16. ACS Nano. 2016. PMID: 26871736

3

Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning.

Mun JH, Cha SK, Kim H, Moon HS, Kim JY, Jin HM, Choi YJ, Baek JE, Shin J, Kim SO. Mun JH, et al. Among authors: cha sk. Small. 2014 Sep 24;10(18):3742-9. doi: 10.1002/smll.201400600. Epub 2014 May 13. Small. 2014. PMID: 24821268

4

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading.

Mun JH, Cha SK, Kim YC, Yun T, Choi YJ, Jin HM, Lee JE, Jeon HU, Kim SY, Kim SO. Mun JH, et al. Among authors: cha sk. Small. 2017 May;13(17). doi: 10.1002/smll.201603939. Epub 2017 Feb 20. Small. 2017. PMID: 28218488

5

Self-Assembly of Complex Multimetal Nanostructures from Perforated Lamellar Block Copolymer Thin Films.

Cha SK, Lee GY, Mun JH, Jin HM, Moon CY, Kim JS, Kim KH, Jeong SJ, Kim SO. Cha SK, et al. ACS Appl Mater Interfaces. 2017 May 10;9(18):15727-15732. doi: 10.1021/acsami.7b03319. Epub 2017 Apr 26. ACS Appl Mater Interfaces. 2017. PMID: 28401753

6

Bimodal phase separated block copolymer/homopolymer blends self-assembly for hierarchical porous metal nanomesh electrodes.

Kim JY, Jin HM, Jeong SJ, Chang T, Kim BH, Cha SK, Kim JS, Shin DO, Choi JY, Kim JH, Yang GG, Jeon S, Lee YG, Kim KM, Shin J, Kim SO. Kim JY, et al. Among authors: cha sk. Nanoscale. 2017 Dec 21;10(1):100-108. doi: 10.1039/c7nr07178g. Nanoscale. 2017. PMID: 29210423

7

Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS.

Jin HM, Kim JY, Heo M, Jeong SJ, Kim BH, Cha SK, Han KH, Kim JH, Yang GG, Shin J, Kim SO. Jin HM, et al. Among authors: cha sk. ACS Appl Mater Interfaces. 2018 Dec 26;10(51):44660-44667. doi: 10.1021/acsami.8b17325. Epub 2018 Dec 11. ACS Appl Mater Interfaces. 2018. PMID: 30480431

8

Nanopatterns with a Square Symmetry from an Orthogonal Lamellar Assembly of Block Copolymers.

Cha SK, Yong D, Yang GG, Jin HM, Kim JH, Han KH, Kim JU, Jeong SJ, Kim SO. Cha SK, et al. ACS Appl Mater Interfaces. 2019 Jun 5;11(22):20265-20271. doi: 10.1021/acsami.9b03632. Epub 2019 May 24. ACS Appl Mater Interfaces. 2019. PMID: 31081329

9

Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer.

Yang GG, Choi J, Cha SK, Lee GY, Jin HM, Hwang HS, Yun T, Kang J, Han KH, Kim JH, Choi HJ, Im SG, Kim SO. Yang GG, et al. Among authors: cha sk. ACS Nano. 2019 Nov 26;13(11):13092-13099. doi: 10.1021/acsnano.9b05859. Epub 2019 Oct 16. ACS Nano. 2019. PMID: 31600440

10

Highly Aligned Carbon Nanowire Array by E-Field Directed Assembly of PAN-Containing Block Copolymers.

Han KH, Kang H, Lee GY, Lee HJ, Jin HM, Cha SK, Yun T, Kim JH, Yang GG, Choi HJ, Ko YK, Jung HT, Kim SO. Han KH, et al. Among authors: cha sk. ACS Appl Mater Interfaces. 2020 Dec 30;12(52):58113-58121. doi: 10.1021/acsami.0c15491. Epub 2020 Dec 16. ACS Appl Mater Interfaces. 2020. PMID: 33325677

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