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Thickness measurement of nm HfO2 films.
Kim KJ, Kim A, Kim CS, Song SW, Ruh H, Unger WES, Radnik J, Mata-Salazar J, Juarez-Garcia JM, Cortazar-Martinez O, Herrera-Gomez A, Hansen PE, Madesen JS, Senna CA, Archanjo BS, Damasceno JC, Achete CA, Wang H, Wang M, Windover D, Steel E, Kurokawa A, Fujimoto T, Azuma Y, Terauchi S, Zhang L, Jordaan WA, Spencer SJ, Shard AG, Koenders L, Krumrey M, Busch I, Jeynes C. Kim KJ, et al. Among authors: senna ca. Metrologia. 2021;58(1A):10.1088/0026-1394/58/1A/08016. doi: 10.1088/0026-1394/58/1A/08016. Metrologia. 2021. PMID: 38883307 Free PMC article. No abstract available.
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