Leakage Current Mechanism of InN-Based Metal-Insulator-Semiconductor Structures with Al2O3 as Dielectric Layers.
Wang X, Zhang GZ, Xu Y, Gan XW, Chen C, Wang Z, Wang Y, Wang JL, Wang T, Wu H, Liu C.
Wang X, et al. Among authors: wang z, wang jl, wang y, wang t.
Nanoscale Res Lett. 2016 Dec;11(1):21. doi: 10.1186/s11671-016-1232-0. Epub 2016 Jan 13.
Nanoscale Res Lett. 2016.
PMID: 26759357
Free PMC article.