Fang F - Search Results

1

Toward Single-Atomic-Layer Lithography on Highly Oriented Pyrolytic Graphite Surfaces Using AFM-Based Electrochemical Etching.

Han W, Mathew PT, Kolagatla S, Rodriguez BJ, Fang F. Han W, et al. Among authors: fang f. Nanomanuf Metrol. 2022;5(1):32-38. doi: 10.1007/s41871-022-00127-9. Epub 2022 Mar 11. Nanomanuf Metrol. 2022. PMID: 35402782 Free PMC article.

2

Investigation of electropolishing characteristics of tungsten in eco-friendly sodium hydroxide aqueous solution.

Han W, Fang FZ. Han W, et al. Adv Manuf. 2020;8(3):265-278. doi: 10.1007/s40436-020-00309-y. Epub 2020 May 26. Adv Manuf. 2020. PMID: 32999753 Free PMC article.

3

Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale.

Wang P, Wang J, Fang F. Wang P, et al. Among authors: fang f. Nanomanuf Metrol. 2021;4(4):216-225. doi: 10.1007/s41871-021-00116-4. Epub 2021 Oct 27. Nanomanuf Metrol. 2021. PMID: 34993418 Free PMC article.

4

Structure Fabrication on Silicon at Atomic and Close-To-Atomic Scale Using Atomic Force Microscopy: Implications for Nanopatterning and Nanodevice Fabrication.

Mathew PT, Han W, Rodriguez BJ, Fang F. Mathew PT, et al. Among authors: fang f. Micromachines (Basel). 2022 Mar 26;13(4):524. doi: 10.3390/mi13040524. Micromachines (Basel). 2022. PMID: 35457829 Free PMC article.

5

Magnetohydrodynamic-based Internal Cooling System for a Ceramic Cutting Tool: Concept Design, Numerical Study, and Experimental Evalidation.

O'Hara J, Fang F. O'Hara J, et al. Among authors: fang f. Nanomanuf Metrol. 2023;6(1):33. doi: 10.1007/s41871-023-00210-9. Epub 2023 Aug 29. Nanomanuf Metrol. 2023. PMID: 37649923 Free PMC article.

6

Cutting-based single atomic layer removal mechanism of monocrystalline copper: edge radius effect.

Xie W, Fang F. Xie W, et al. Among authors: fang f. Nanoscale Res Lett. 2019 Dec 6;14(1):370. doi: 10.1186/s11671-019-3195-4. Nanoscale Res Lett. 2019. PMID: 31811570 Free PMC article.

7

Ab initio simulations of ultrashort laser pulse interaction with Cl-Si(100): implications for atomic layer etching.

Wang P, Fang F. Wang P, et al. Among authors: fang f. Phys Chem Chem Phys. 2023 Aug 9;25(31):20871-20879. doi: 10.1039/d3cp02388e. Phys Chem Chem Phys. 2023. PMID: 37522855

8

Defect-Mediated Atomic Layer Etching Processes on Cl-Si(100): An Atomistic Insight.

Wang P, Fang F. Wang P, et al. Among authors: fang f. J Phys Chem C Nanomater Interfaces. 2023 Oct 23;127(43):21106-21113. doi: 10.1021/acs.jpcc.3c05378. eCollection 2023 Nov 2. J Phys Chem C Nanomater Interfaces. 2023. PMID: 37937159 Free PMC article.

9

Polishing Approaches at Atomic and Close-to-Atomic Scale.

Geng Z, Huang N, Castelli M, Fang F. Geng Z, et al. Among authors: fang f. Micromachines (Basel). 2023 Jan 29;14(2):343. doi: 10.3390/mi14020343. Micromachines (Basel). 2023. PMID: 36838045 Free PMC article. Review.

10

Study on surface thermal oxidation of silicon carbide irradiated by pulsed laser using reactive molecular dynamics.

An H, Wang J, Fang F. An H, et al. Among authors: fang f. J Chem Phys. 2023 Mar 14;158(10):104702. doi: 10.1063/5.0137778. J Chem Phys. 2023. PMID: 36922148

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