Development and analysis of thick GaN drift layers on 200 mm CTE-matched substrate for vertical device processing.
Gonçalez Filho W, Borga M, Geens K, Cingu D, Chatterjee U, Banerjee S, Vohra A, Han H, Minj A, Hahn H, Marx M, Fahle D, Bakeroot B, Decoutere S.
Gonçalez Filho W, et al. Among authors: bakeroot b.
Sci Rep. 2023 Sep 23;13(1):15931. doi: 10.1038/s41598-023-42747-1.
Sci Rep. 2023.
PMID: 37741914
Free PMC article.