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Pulsed processing by cold plasma, applied to industrial emission control.
Van Heesch EJM, Huiskamp T, Yan K, Beckers FJCM, Smulders HWM, Winands GJJ, Lemmens RHP, Blom PPM, Segura SD, Hoeben WFLM, Van Paasen SVB, Van Oorschot JJ, Bonkestoter AGA, Van Den Brand MLJ, Hennink M, Smulders RWJ, Pemen AJM, Van Der Laan PCT. Van Heesch EJM, et al. Among authors: huiskamp t. Front Chem. 2024 Jun 7;12:1386055. doi: 10.3389/fchem.2024.1386055. eCollection 2024. Front Chem. 2024. PMID: 38911992 Free PMC article.