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2021 | 2 |
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4-Levels Vertically Stacked SiGe Channel Nanowires Gate-All-Around Transistor with Novel Channel Releasing and Source and Drain Silicide Process.
Nanomaterials (Basel). 2022 Mar 7;12(5):889. doi: 10.3390/nano12050889.
Nanomaterials (Basel). 2022.
PMID: 35269377
Free PMC article.
Four-Period Vertically Stacked SiGe/Si Channel FinFET Fabrication and Its Electrical Characteristics.
Li Y, Zhao F, Cheng X, Liu H, Zan Y, Li J, Zhang Q, Wu Z, Luo J, Wang W.
Li Y, et al.
Nanomaterials (Basel). 2021 Jun 28;11(7):1689. doi: 10.3390/nano11071689.
Nanomaterials (Basel). 2021.
PMID: 34203194
Free PMC article.
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Investigate on the Mechanism of HfO2/Si0.7Ge0.3 Interface Passivation Based on Low-Temperature Ozone Oxidation and Si-Cap Methods.
Yao Q, Ma X, Wang H, Wang Y, Wang G, Zhang J, Liu W, Wang X, Yan J, Li Y, Wang W.
Yao Q, et al.
Nanomaterials (Basel). 2021 Apr 9;11(4):955. doi: 10.3390/nano11040955.
Nanomaterials (Basel). 2021.
PMID: 33918553
Free PMC article.
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