The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species
Angew Chem Int Ed Engl
.
2005 Jul 25;44(30):4749-53.
doi: 10.1002/anie.200500320.
Authors
W J Zhang
1
,
C Y Chan
,
X M Meng
,
M K Fung
,
I Bello
,
Y Lifshitz
,
S T Lee
,
X Jiang
Affiliation
1
Center Of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong SAR, China.
[email protected]
PMID:
15995991
DOI:
10.1002/anie.200500320
No abstract available