Nevirapine plasma exposure affects both durability of viral suppression and selection of nevirapine primary resistance mutations in a clinical setting

Antimicrob Agents Chemother. 2005 Sep;49(9):3966-9. doi: 10.1128/AAC.49.9.3966-3969.2005.

Abstract

The relationship between nevirapine plasma concentrations and the durability of both viral suppression (VS) and selection of nevirapine primary resistance mutations (PRMs) was evaluated. A nevirapine trough concentration (Ctrough) of >4,300 ng/ml was found to predict longer VS. Patients with nevirapine Ctrough s ranging from 3,100 to 4,300 ng/ml had higher probabilities of developing PRMs than those with nevirapine Ctrough s below and above this concentration interval.

MeSH terms

  • Adult
  • Anti-HIV Agents / blood*
  • Anti-HIV Agents / pharmacokinetics
  • Anti-HIV Agents / therapeutic use
  • Drug Resistance, Viral
  • Female
  • Genotype
  • HIV Infections / drug therapy
  • HIV Infections / virology*
  • HIV-1 / drug effects
  • HIV-1 / genetics
  • Humans
  • Male
  • Mutation
  • Nevirapine / blood*
  • Nevirapine / pharmacokinetics
  • Nevirapine / therapeutic use
  • ROC Curve
  • Retrospective Studies

Substances

  • Anti-HIV Agents
  • Nevirapine