Abstract
We describe a small hollow-cathode plasma source suitable for small-scale materials synthesis and modification application. The supporting electrical system is minimal. The gaseous plasma source delivers a plasma ion current of up to about 1 mA. Here we outline the source construction and operation, and present some of its basic performance characteristics.
Publication types
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Research Support, Non-U.S. Gov't
MeSH terms
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Equipment Design
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Equipment Failure Analysis
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Gases / chemistry*
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Heating / instrumentation*
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Heating / methods
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Materials Testing / instrumentation*
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Materials Testing / methods
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Microfluidics / instrumentation*
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Microfluidics / methods
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Miniaturization
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Reproducibility of Results
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Sensitivity and Specificity