Light induced patterning of poly(dimethylsiloxane) microstructures

Opt Express. 2010 May 24;18(11):10947-55. doi: 10.1364/OE.18.010947.

Abstract

A new method for direct patterning of Poly(dimethylsiloxane) (PDMS) microstructures is developed by taking advantage of photorefractive effect in a functionalized substrate. Here we show that when a x-cut Iron doped Lithium Niobate (LN) crystal is exposed to appropriate structured laser light, a charge density pattern builds-up in the crystal and a space charge field arise that is able to induce self-patterning of the PDMS liquid film deposited on its surface via the dielectrophoretic effects. Proper heating treatment allows to achieve polymeric linking process creating a solid and stable PDMS microstructures. The self-patterned structures replicate the illuminating light pattern. We show that 1D and 2D patterning of PDMS gratings can be achieved. This new soft-lithographic approach can pave the way for realizing PDMS micro-structures with high degree of flexibility that avoids the need of moulds fabrication.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Dimethylpolysiloxanes / chemistry*
  • Dimethylpolysiloxanes / radiation effects*
  • Light
  • Materials Testing
  • Miniaturization
  • Refractometry / methods*
  • Surface Properties

Substances

  • Dimethylpolysiloxanes
  • baysilon