An x-ray photoelectron spectra and atomic force microscopy characterization of silica substrates engineered with a covalently assembled siloxane monolayer

Nanotechnology. 2005 Oct;16(10):2170-5. doi: 10.1088/0957-4484/16/10/033. Epub 2005 Aug 16.

Abstract

Silica substrates were functionalized with a covalent 4-ClCH(2)C(6)H(4)SiCl(3) monolayer. Additional covalent bonding of appropriate functional molecules to the silylated substrates was further achieved. The surface chemical characterization was carried out by angle resolved x-ray photoelectron measurements. Moreover, surface morphological characterizations were performed by atomic force microscopy measurements. Present results provide step by step information on the covalently linked monolayer during the synthetic procedure.