High-fidelity conformation of graphene to SiO2 topographic features

Phys Rev Lett. 2010 Nov 19;105(21):215504. doi: 10.1103/PhysRevLett.105.215504. Epub 2010 Nov 19.

Abstract

High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.