Molecular lithography through DNA-mediated etching and masking of SiO2

Sumedh P Surwade; Shichao Zhao; Haitao Liu

doi:10.1021/ja2038886

Molecular lithography through DNA-mediated etching and masking of SiO2

J Am Chem Soc. 2011 Aug 10;133(31):11868-71. doi: 10.1021/ja2038886. Epub 2011 Jul 19.

Authors

Sumedh P Surwade¹, Shichao Zhao, Haitao Liu

Affiliation

¹ Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.

PMID: 21751796
DOI: 10.1021/ja2038886

Abstract

We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

DNA / chemistry*
Kinetics
Nanostructures / chemistry*
Particle Size
Silicon Dioxide / chemistry*
Surface Properties

Substances

Silicon Dioxide
DNA