Electrostriction at the LaAlO3/SrTiO3 interface

C Cancellieri; D Fontaine; S Gariglio; N Reyren; A D Caviglia; A Fête; S J Leake; S A Pauli; P R Willmott; M Stengel; Ph Ghosez; J-M Triscone

doi:10.1103/PhysRevLett.107.056102

Electrostriction at the LaAlO3/SrTiO3 interface

Phys Rev Lett. 2011 Jul 29;107(5):056102. doi: 10.1103/PhysRevLett.107.056102. Epub 2011 Jul 28.

Authors

C Cancellieri¹, D Fontaine, S Gariglio, N Reyren, A D Caviglia, A Fête, S J Leake, S A Pauli, P R Willmott, M Stengel, Ph Ghosez, J-M Triscone

Affiliation

¹ DPMC, University of Geneva, 24 Quai Ernest-Ansermet, 1211 Geneva 4, Switzerland. [email protected]

PMID: 21867080
DOI: 10.1103/PhysRevLett.107.056102

Abstract

We present a direct comparison between experimental data and ab initio calculations for the electrostrictive effect in the polar LaAlO(3) layer grown on SrTiO(3) substrates. From the structural data, a complete screening of the LaAlO(3) dipole field is observed for film thicknesses between 6 and 20 uc. For thinner films, an expansion of the c axis of 2% matching the theoretical predictions for an electrostrictive effect is observed experimentally.