Precise patterning of silk microstructures using photolithography

Nicholas E Kurland; Tuli Dey; Subhas C Kundu; Vamsi K Yadavalli

doi:10.1002/adma.201302823

Precise patterning of silk microstructures using photolithography

Adv Mater. 2013 Nov 20;25(43):6207-12. doi: 10.1002/adma.201302823. Epub 2013 Aug 20.

Authors

Nicholas E Kurland¹, Tuli Dey, Subhas C Kundu, Vamsi K Yadavalli

Affiliation

¹ Department of Chemical and Life Science Engineering, Virginia Commonwealth University, 601 W Main Street, Richmond, VA, USA, 23284.

PMID: 24038619
DOI: 10.1002/adma.201302823

Abstract

Photolithography is used in conjunction with a "silk fibroin photoresist" to form precise protein microstructures directly and rapidly on a variety of substrates. High-resolution features in two and three dimensions with line widths down to one micrometer are formed. Photo-crosslinked protein structures guide cell adhesion, providing precise spatial control of cells without requiring adhesive ligands.

Keywords: fibroin; micropatterning; photolithography; protein photoresist; silk.

Publication types

Research Support, Non-U.S. Gov't