Production of centimeter-scale gradient patterns by graded elastomeric tip array

Large-area patterned surfaces with chemical and/or morphological gradients have significant applications in biology, chemistry, and materials science. In this work, we developed a unique lithographic strategy to fabricate 2D and 3D gradient patterns with gradually varying feature size or height over centimeter-scale areas by utilizing a large-area polydimethylsiloxane (PDMS) tip array with programmable tip apex as a conformal photomask in near-field photolithography. Meanwhile, a new strategy was developed to create the PDMS tip array with graded apex size, which was employed to fabricate gradient patterns with the lateral feature sizes changing from sub-100 nm to several microns on one single substrate over macroscopic (square centimeter) areas. Furthermore, 3D gradient patterns with spatially varying feature height were enabled by employing gradient exposure dose. The formation of gradient feature size was ascribed either to gradient contact areas between tips and substrates or to exposure dose gradient. This lithography strategy combines the advantages of a wide range of feature sizes, simplicity, high-throughput, low-cost and diversified feature shapes, making it a facile and flexible approach to manufacture various functional gradient structures.