Spontaneous Patterning of High-Resolution Electronics via Parallel Vacuum Ultraviolet

Xuying Liu; Masayuki Kanehara; Chuan Liu; Kenji Sakamoto; Takeshi Yasuda; Jun Takeya; Takeo Minari

doi:10.1002/adma.201506151

Spontaneous Patterning of High-Resolution Electronics via Parallel Vacuum Ultraviolet

Adv Mater. 2016 Aug;28(31):6568-73. doi: 10.1002/adma.201506151. Epub 2016 May 17.

Authors

Xuying Liu¹, Masayuki Kanehara², Chuan Liu³, Kenji Sakamoto¹, Takeshi Yasuda¹, Jun Takeya⁴, Takeo Minari^{1

4}

Affiliations

¹ World Premier International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki, 305-0044, Japan.
² Colloidal Ink. Co., Ltd, Sojya-shi, Okayama, 719-1121, Japan.
³ State Key Laboratory of Optoelectronic Materials and Technologies, Guangdong Province Key Laboratory of Display Material and Technology and School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou, 510275, P. R. China.
⁴ The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, 277-8561, Chiba, Japan.

PMID: 27184834
DOI: 10.1002/adma.201506151

Abstract

A spontaneous patterning technique via parallel vacuum ultraviolet is developed for fabricating large-scale, complex electronic circuits with 1 μm resolution. The prepared organic thin-film transistors exhibit a low contact resistance of 1.5 kΩ cm, and high mobilities of 0.3 and 1.5 cm(2) V(-1) s(-1) in the devices with channel lengths of 1 and 5 μm, respectively.

Keywords: Au nanoparticle ink; organic thin-film transistors; parallel vacuum ultraviolet; patterning.