Oxide-Nanotrap-Anchored Platinum Nanoparticles with High Activity and Sintering Resistance by Area-Selective Atomic Layer Deposition

Angew Chem Int Ed Engl. 2017 Feb 1;56(6):1648-1652. doi: 10.1002/anie.201611559. Epub 2017 Jan 9.

Abstract

An area-selective atomic layer deposition (AS-ALD) method is described to construct oxide nanotraps to anchor Pt nanoparticles (NPs) on Al2 O3 supports. The as-synthesized catalysts have exhibited outstanding room-temperature CO oxidation activity, with a significantly lowered apparent activation energy (ca. 22.17 kJ mol-1 ) that is half that of pure Pt catalyst with the same loading. Furthermore, the structure shows excellent sintering resistance with the high catalytic activity retention up to 600 °C calcination. The key feature of the oxide nanotraps lies in its ability to anchor Pt NPs via strong metal-oxide interactions while still leaving active metal facets exposed. Our reported method for forming such oxide structure with nanotraps shows great potential for the simultaneous enhancement of thermal stability and activity of precious metal NPs.

Keywords: Co3O4 nanotraps; Pt nanoparticles; area-selective atomic layer deposition; room-temperature CO oxidation; thermal stability.

Publication types

  • Research Support, Non-U.S. Gov't