Erratum to: The Influence of Hafnium Doping on Density-of-States in Zinc Oxide Thin-Film Fransistors Deposited Via Atomic Layer Deposition

Nanoscale Res Lett. 2017 Dec;12(1):172. doi: 10.1186/s11671-017-1927-x. Epub 2017 Mar 7.

Xingwei Ding^{1

2}, Cunping Qin², Jiantao Song¹, Jianhua Zhang^{3

4}, Xueyin Jiang⁵, Zhilin Zhang^{1

5}

¹ Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China.
² School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China.
³ Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Shanghai, Jingan District, 200070, People's Republic of China. [email protected].
⁴ School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China. [email protected].
⁵ Department of Materials Science, Shanghai University, Shanghai, 200072, China.

No abstract available

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