Exploiting λ-Orthogonal Photoligation for Layered Surface Patterning

We exploit λ-orthogonal photoligation of nitrile imine-mediated tetrazole-ene cycloaddition (NITEC) chemistry to generate complex, interconnected surface modifications via a simple layered surface patterning approach. By judicious choice of activating chromophores, we introduce a one pot reaction where nitrile imine formation can be triggered independently of other tetrazoles present. When irradiated with visible light, a tetrazole bearing a pyrene chromophore undergoes quantitative elimination of nitrogen to release nitrile imine (which subsequently undergoes trapping with a dipolarophile in a 1,3 dipolar cycloaddition) whereas a tetrazole bearing a phenyl moiety remains unreacted. Subsequent irradiation of the solution with UV light yields the N-phenyl containing nitrile imine quantitatively, while the pyrene pyrazoline adduct remains unchanged. This λ-orthogonal photoligation was subsequently exploited for the generation of layered patterned surfaces. Specifically, the visible light active tetrazole was grafted to a silicon wafer and subsequently photolithographically patterned with a dipolarophile modified with a UV-active tetrazole. Various electron deficient olefins were then patterned in a spatially resolved manner relying on different light activation. The desired functionality was successfully imaged on the silicon wafers using time-of-flight-secondary ion mass spectrometry (ToF-SIMS), demonstrating that a powerful mask-less lithographic platform technology has been established.