Correction: Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

Dong-Jin Yun; Seyun Kim; Changhoon Jung; Chang-Seok Lee; Hiesang Sohn; Jung Yeon Won; Yong Su Kim; JaeGwan Chung; Sung Heo; Seong Heon Kim; Minsu Seol; Weon Ho Shin

doi:10.1039/c7cp90282d

Correction: Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

Phys Chem Chem Phys. 2018 Jan 24;20(4):2914. doi: 10.1039/c7cp90282d.

Authors

Dong-Jin Yun¹, Seyun Kim, Changhoon Jung, Chang-Seok Lee, Hiesang Sohn, Jung Yeon Won, Yong Su Kim, JaeGwan Chung, Sung Heo, Seong Heon Kim, Minsu Seol, Weon Ho Shin

Affiliation

¹ Analytical Science Laboratory, Samsung Advanced Institute of Technology, 130 Samsung-ro, Yeongtong-gu, Suwon, Gyeonggi-do 16678, Republic of Korea.

PMID: 29303525
DOI: 10.1039/c7cp90282d

Abstract

Correction for 'Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering' by Dong-Jin Yun et al., Phys. Chem. Chem. Phys., 2018, 20, 615-622.

Publication types

Published Erratum