The formation and thermal stability of Pt surface oxides on a Pt thin film were studied in situ using ambient-pressure X-ray photoelectron spectroscopy. At an oxygen pressure of 73 Pa (550 mTorr), the surface Pt oxide was gradually formed, evidenced by the O 1s peak at 529.5 eV as the Pt film was heated. The Pt oxide peak reached a maximum between 217 and 317 °C and then decreased as the sample temperature was further increased. A similar response was seen on cooling from 480 to 23 °C; the intensity of the Pt oxide peak first increased and then decreased. The remaining Pt surface oxides partially decomposed during ultra-high-vacuum (UHV) pumping and completely decomposed during heating in UHV, which highlights the challenge of characterizing these surfaces with UHV instruments. These results have important implications for the understanding of the surface states of platinum films in different environments and the roles of different catalytic mechanisms.