Epitaxial Growth of GaN Films on Chemical-Vapor-Deposited 2D MoS₂ Layers by Plasma-Assisted Molecular Beam Epitaxy

The van der Waals epitaxy of wafer-scale GaN on 2D MoS₂ and the integration of GaN/MoS₂ heterostructures were investigated in this report. GaN films have been successfully grown on 2D MoS₂ layers using three different Ga fluxes via a plasma-assisted molecular beam epitaxy (PA-MBE) system. The substrate for the growth was a few-layer 2D MoS₂ deposited on sapphire using chemical vapor deposition (CVD). Three different Ga fluxes were provided by the gallium source of the K-cell at temperatures of 825, 875, and 925 °C, respectively. After the growth, RHEED, HR-XRD, and TEM were conducted to study the crystal structure of GaN films. The surface morphology was obtained using FE-SEM and AFM. Chemical composition was confirmed by XPS and EDS. Raman and PL spectra were carried out to investigate the optical properties of GaN films. According to the characterizations of GaN films, the van der Waals epitaxial growth mechanism of GaN films changed from 3D to 2D with the increase in Ga flux, provided by higher temperatures of the K-cell. GaN films grown at 750 °C for 3 h with a K-cell temperature of 925 °C demonstrated the greatest crystal quality, chemical composition, and optical properties. The heterostructure of 3D GaN on 2D MoS₂ was integrated successfully using the low-temperature PA-MBE technique, which could be applied to novel electronics and optoelectronics.