Fabrication of a uniform quantum dot film with a high quantum yield

Nanotechnology. 2024 Oct 29;36(3). doi: 10.1088/1361-6528/ad86c6.

Abstract

We present a method that uses viscosity-lowering materials to fabricate flexible polydimethylsiloxane-based quantum dot (QD) films with high quantum yield (QY) and improved uniformity. We found that the aggregation of individual QDs was prevented, and the QY improved simultaneously in films that contained surfactants. These films showed an improved absorption of approximately 27% in the near-UV and blue light regions, along with an improved photoluminescence of approximately 18%, indicating improved light conversion from the UV to the visible frequency region.

Keywords: Bis (trimethylsilyl)amine (HMDS); ethyl acetate; polydimethylsiloxane (PDMS); quantum dots; quantum yield; uniformity.