Author Correction: Improved oxidation behavior of Hf_0.11Al_0.20B_0.69 in comparison to Hf_0.28B_0.72 magnetron sputtered thin films

Affiliations

• ¹ Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074, Aachen, Germany. [email protected].
• ² Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074, Aachen, Germany.
• ³ Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602, Thun, Switzerland.
• ⁴ Plansee Composite Materials GmbH, Siebenbürgerstr. 23, 86963, Lechbruck am See, Germany.
• ⁵ Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, 75120, Uppsala, Sweden.