Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.
Zhu Y, Sugisaki K, Okada M, Otaki K, Liu Z, Kawakami J, Ishii M, Saito J, Murakami K, Hasegawa M, Ouchi C, Kato S, Hasegawa T, Suzuki A, Yokota H, Niibe M.
Zhu Y, et al. Among authors: liu z.
Appl Opt. 2007 Sep 20;46(27):6783-92. doi: 10.1364/ao.46.006783.
Appl Opt. 2007.
PMID: 17882300