Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
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Svechnikov MV, et al. Among authors: nechay an.
Opt Express. 2018 Dec 24;26(26):33718-33731. doi: 10.1364/OE.26.033718.
Opt Express. 2018.
PMID: 30650805
Free article.