Zhang C - Search Results

1

Robust solution to the inverse problem in optical scatterometry.

Zhu J, Liu S, Chen X, Zhang C, Jiang H. Zhu J, et al. Among authors: zhang c. Opt Express. 2014 Sep 8;22(18):22031-42. doi: 10.1364/OE.22.022031. Opt Express. 2014. PMID: 25321577 Free article.

2

[Model-based FTIR reflectometry measurement system for deep trench structures of DRAM].

Liu SY, Zhang CW, Shen HW, Gu HY. Liu SY, et al. Guang Pu Xue Yu Guang Pu Fen Xi. 2009 Apr;29(4):935-9. Guang Pu Xue Yu Guang Pu Fen Xi. 2009. PMID: 19626876 Chinese.

3

Improved model-based infrared reflectrometry for measuring deep trench structures.

Zhang C, Liu S, Shi T, Tang Z. Zhang C, et al. J Opt Soc Am A Opt Image Sci Vis. 2009 Nov;26(11):2327-35. doi: 10.1364/JOSAA.26.002327. J Opt Soc Am A Opt Image Sci Vis. 2009. PMID: 19884928

4

Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry.

Zhang C, Liu S, Shi T, Tang Z. Zhang C, et al. J Opt Soc Am A Opt Image Sci Vis. 2011 Feb 1;28(2):263-71. doi: 10.1364/JOSAA.28.000263. J Opt Soc Am A Opt Image Sci Vis. 2011. PMID: 21293531

5

Improved measurement accuracy in optical scatterometry using correction-based library search.

Chen X, Liu S, Zhang C, Jiang H. Chen X, et al. Among authors: zhang c. Appl Opt. 2013 Sep 20;52(27):6726-34. doi: 10.1364/AO.52.006726. Appl Opt. 2013. PMID: 24085171

6

Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry.

Chen X, Liu S, Zhang C, Jiang H, Ma Z, Sun T, Xu Z. Chen X, et al. Among authors: zhang c. Opt Express. 2014 Jun 16;22(12):15165-77. doi: 10.1364/OE.22.015165. Opt Express. 2014. PMID: 24977609 Free article.

7

Efficient representation of mask transmittance functions for vectorial lithography simulations.

Zhou X, Zhang C, Jiang H, Wei H, Liu S. Zhou X, et al. Among authors: zhang c. J Opt Soc Am A Opt Image Sci Vis. 2014 Dec 1;31(12):B10-8. doi: 10.1364/JOSAA.31.000B10. J Opt Soc Am A Opt Image Sci Vis. 2014. PMID: 25606775

8

Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry.

Zhu J, Liu S, Jiang H, Zhang C, Chen X. Zhu J, et al. Among authors: zhang c. Opt Lett. 2015 Feb 15;40(4):471-4. doi: 10.1364/OL.40.000471. Opt Lett. 2015. PMID: 25680127

9

Calibration of misalignment errors in composite waveplates using Mueller matrix ellipsometry.

Gu H, Liu S, Chen X, Zhang C. Gu H, et al. Among authors: zhang c. Appl Opt. 2015 Feb 1;54(4):684-93. doi: 10.1364/AO.54.000684. Appl Opt. 2015. PMID: 25967775

10

Mueller matrix imaging ellipsometry for nanostructure metrology.

Liu S, Du W, Chen X, Jiang H, Zhang C. Liu S, et al. Among authors: zhang c. Opt Express. 2015 Jun 29;23(13):17316-29. doi: 10.1364/OE.23.017316. Opt Express. 2015. PMID: 26191741 Free article.

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