Fang GY - Search Results

1

Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications.

Wang LG, Qian X, Cao YQ, Cao ZY, Fang GY, Li AD, Wu D. Wang LG, et al. Among authors: fang gy. Nanoscale Res Lett. 2015 Mar 19;10:135. doi: 10.1186/s11671-015-0846-y. eCollection 2015. Nanoscale Res Lett. 2015. PMID: 25852426 Free PMC article.

2

Rapid atomic layer deposition of silica nanolaminates: synergistic catalysis of Lewis/Brønsted acid sites and interfacial interactions.

Fang G, Ma J. Fang G, et al. Nanoscale. 2013 Dec 7;5(23):11856-69. doi: 10.1039/c3nr02086j. Nanoscale. 2013. PMID: 24126605

3

Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2.

Fang GY, Xu LN, Cao YQ, Wang LG, Wu D, Li AD. Fang GY, et al. Chem Commun (Camb). 2015 Jan 25;51(7):1341-4. doi: 10.1039/c4cc08004a. Chem Commun (Camb). 2015. PMID: 25485760

4

Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst.

Fang GY, Xu LN, Wang LG, Cao YQ, Wu D, Li AD. Fang GY, et al. Nanoscale Res Lett. 2015 Feb 18;10:68. doi: 10.1186/s11671-014-0714-1. eCollection 2015. Nanoscale Res Lett. 2015. PMID: 25897298 Free PMC article.

5

Interfacial catalysis in and initial reaction mechanism of Al₂O₃ films fabricated by atomic layer deposition using non-hydrolytic sol-gel chemistry.

Xu L, Fang G, Cao Y, Li A. Xu L, et al. Phys Chem Chem Phys. 2016 Nov 16;18(45):31223-31229. doi: 10.1039/c6cp05842f. Phys Chem Chem Phys. 2016. PMID: 27819089

6

Growth Mechanism, Ambient Stability, and Charge Trapping Ability of Ti-Based Maleic Acid Hybrid Films by Molecular Layer Deposition.

Cao YQ, Zhang W, Xu L, Liu C, Zhu L, Wang LG, Wu D, Li AD, Fang G. Cao YQ, et al. Langmuir. 2019 Feb 26;35(8):3020-3030. doi: 10.1021/acs.langmuir.8b04137. Epub 2019 Feb 15. Langmuir. 2019. PMID: 30722663

7

Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water.

Xu R, Zhou Z, Li J, Zhang X, Zhu Y, Xiao H, Xu L, Ding Y, Li A, Fang G. Xu R, et al. Front Chem. 2022 Nov 4;10:1035902. doi: 10.3389/fchem.2022.1035902. eCollection 2022. Front Chem. 2022. PMID: 36405315 Free PMC article.

8

First-Principles Molecular Dynamics Simulations on Water-Solid Interface Behavior of H₂O-Based Atomic Layer Deposition of Zirconium Dioxide.

Xu R, Zhou Z, Wang Y, Xiao H, Xu L, Ding Y, Li X, Li A, Fang G. Xu R, et al. Nanomaterials (Basel). 2022 Dec 7;12(24):4362. doi: 10.3390/nano12244362. Nanomaterials (Basel). 2022. PMID: 36558215 Free PMC article.

9

Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water.

Xu R, Zhou Z, Li J, Zhang X, Zhu Y, Xiao H, Xu L, Ding Y, Li A, Fang G. Xu R, et al. Front Chem. 2022 Dec 20;10:1118819. doi: 10.3389/fchem.2022.1118819. eCollection 2022. Front Chem. 2022. PMID: 36605119 Free PMC article.

10

Reaction mechanism of nickel sulfide atomic layer deposition using bis(N,N'-di-tert-butylacetamidinato)nickel(II) and hydrogen sulfide.

Zhang X, Zhou Z, Xu R, Guo J, Xu L, Ding Y, Xiao H, Li X, Li A, Fang G. Zhang X, et al. Phys Chem Chem Phys. 2023 May 17;25(19):13465-13473. doi: 10.1039/d2cp05450g. Phys Chem Chem Phys. 2023. PMID: 37132216

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