Elliott SD - Search Results

1

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper.

Dey G, Wrench JS, Hagen DJ, Keeney L, Elliott SD. Dey G, et al. Among authors: elliott sd. Dalton Trans. 2015 Jun 14;44(22):10188-99. doi: 10.1039/c5dt00922g. Dalton Trans. 2015. PMID: 25914999

2

Mechanism for the atomic layer deposition of copper using diethylzinc as the reducing agent: a density functional theory study using gas-phase molecules as a model.

Dey G, Elliott SD. Dey G, et al. Among authors: elliott sd. J Phys Chem A. 2012 Sep 6;116(35):8893-901. doi: 10.1021/jp304460z. Epub 2012 Aug 22. J Phys Chem A. 2012. PMID: 22891810

3

Classification of processes for the atomic layer deposition of metals based on mechanistic information from density functional theory calculations.

Elliott SD, Dey G, Maimaiti Y. Elliott SD, et al. J Chem Phys. 2017 Feb 7;146(5):052822. doi: 10.1063/1.4975085. J Chem Phys. 2017. PMID: 28178842

4

Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition.

Elliott SD, Dey G, Maimaiti Y, Ablat H, Filatova EA, Fomengia GN. Elliott SD, et al. Adv Mater. 2016 Jul;28(27):5367-80. doi: 10.1002/adma.201504043. Epub 2015 Dec 21. Adv Mater. 2016. PMID: 26689290

5

Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions.

Shirazi M, Elliott SD. Shirazi M, et al. Among authors: elliott sd. Nanoscale. 2015 Apr 14;7(14):6311-8. doi: 10.1039/c5nr00900f. Nanoscale. 2015. PMID: 25786200

6

Density functional theory predictions of the composition of atomic layer deposition-grown ternary oxides.

Murray C, Elliott SD. Murray C, et al. Among authors: elliott sd. ACS Appl Mater Interfaces. 2013 May;5(9):3704-15. doi: 10.1021/am400310p. Epub 2013 Apr 16. ACS Appl Mater Interfaces. 2013. PMID: 23544705

7

Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitride.

Murray CA, Elliott SD, Hausmann D, Henri J, LaVoie A. Murray CA, et al. Among authors: elliott sd. ACS Appl Mater Interfaces. 2014 Jul 9;6(13):10534-41. doi: 10.1021/am5021167. Epub 2014 Jun 18. ACS Appl Mater Interfaces. 2014. PMID: 24915469

8

Understanding 'clean-up' of III-V native oxides during atomic layer deposition using bulk first principles models.

Klejna S, Elliott SD. Klejna S, et al. Among authors: elliott sd. J Nanosci Nanotechnol. 2011 Sep;11(9):8246-50. doi: 10.1166/jnn.2011.5044. J Nanosci Nanotechnol. 2011. PMID: 22097563

9

Mechanism, products, and growth rate of atomic layer deposition of noble metals.

Elliott SD. Elliott SD. Langmuir. 2010 Jun 15;26(12):9179-82. doi: 10.1021/la101207y. Langmuir. 2010. PMID: 20469852

10

Understanding the Mechanism of SiC Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Developing Routes toward SiC Atomic Layer Deposition (ALD) with Density Functional Theory.

Filatova EA, Hausmann D, Elliott SD. Filatova EA, et al. Among authors: elliott sd. ACS Appl Mater Interfaces. 2018 May 2;10(17):15216-15225. doi: 10.1021/acsami.8b00794. Epub 2018 Apr 17. ACS Appl Mater Interfaces. 2018. PMID: 29634908

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