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Continuum models of focused electron beam induced processing.
Toth M, Lobo C, Friedli V, Szkudlarek A, Utke I. Toth M, et al. Beilstein J Nanotechnol. 2015 Jul 14;6:1518-40. doi: 10.3762/bjnano.6.157. eCollection 2015. Beilstein J Nanotechnol. 2015. PMID: 26425405 Free PMC article. Review.
Cryogenic electron beam induced chemical etching.
Martin AA, Toth M. Martin AA, et al. Among authors: toth m. ACS Appl Mater Interfaces. 2014 Nov 12;6(21):18457-60. doi: 10.1021/am506163w. Epub 2014 Oct 23. ACS Appl Mater Interfaces. 2014. PMID: 25333843
1,497 results