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Room temperature migration of boron in crystalline silicon.
Napolitani E, De Salvador D, Storti R, Carnera A, Mirabella S, Priolo F. Napolitani E, et al. Among authors: priolo f. Phys Rev Lett. 2004 Jul 30;93(5):055901. doi: 10.1103/PhysRevLett.93.055901. Epub 2004 Jul 30. Phys Rev Lett. 2004. PMID: 15323711
Atomistic mechanism of boron diffusion in silicon.
De Salvador D, Napolitani E, Mirabella S, Bisognin G, Impellizzeri G, Carnera A, Priolo F. De Salvador D, et al. Among authors: priolo f. Phys Rev Lett. 2006 Dec 22;97(25):255902. doi: 10.1103/PhysRevLett.97.255902. Epub 2006 Dec 20. Phys Rev Lett. 2006. PMID: 17280368
Mechanism of boron diffusion in amorphous silicon.
Mirabella S, De Salvador D, Bruno E, Napolitani E, Pecora EF, Boninelli S, Priolo F. Mirabella S, et al. Among authors: priolo f. Phys Rev Lett. 2008 Apr 18;100(15):155901. doi: 10.1103/PhysRevLett.100.155901. Epub 2008 Apr 15. Phys Rev Lett. 2008. PMID: 18518128
125 results